Correction: Tantalum(v) 1,3-propanediolate β-diketonate solution as a precursor to sol–gel derived, metal oxide thin films

Rare earth β-diketonate and carboxylate metal complexes as precursors for MOCVD of oxide films

Volatile and thermostable complexs of lanthanide acetylacetonates and pivalates were obtained and investigated by different methods. These compounds were used for lanthanide oxide containing film producing and for fabrication of silica optical fibers doped by lanthanide oxide. The properties of these and already known volatile precursors are compared. It is well recognized that rare earth conta...

Metal oxide thin films as sensing layers for ozone detection.

In2O3-x thin films with a thickness of 100-990 nm were grown by dc magnetron sputtering. Their structural, electrical and ozone sensing properties were analyzed. Structural investigations carried out by electron probe micro analysis, secondary ion mass spectrometry and atomic force microscopy showed a strong correlation between stoichiometry, surface topology and gas sensitivity. Moreover, the ...

Chiral thin films of metal oxide.

In this paper, we describe for the first time the synthesis of new chiral nanosized metal oxide surfaces based on chiral self-assembled monolayers (SAMs) coated with metal oxide (TiO2) nanolayers. In this new type of nanosize chiral surface, the metal oxide nanolayers enable the protection of the chiral self-assembled monolayers while preserving their enantioselective nature. The chiral nature ...

Heat Treatment in Molecular Precursor Method for Fabricating Metal Oxide Thin Films

Atomic layer deposition process with TiF4 as a precursor for depositing metal fluoride thin films.

A novel atomic layer deposition process for the preparation of fluoride thin films in a temperature range of 225 degrees C-400 degrees C is introduced. The crystallinity, morphology, composition, thicknesses, refractive indices, and transmittance of the films are analyzed. Low impurity levels are obtained at 350 degrees C-400 degrees C with good stoichiometry. Refractive indices of 1.34-1.42 fo...